Revolutionary high throughput scanning probe microscopy for Semicon metrology

Nearfield Instruments delivers daringly innovative metrology solutions to process control challenges in the high-end nano-electronics industry. QUADRA™ is our surface metrology solution for the most advanced semiconductor nodes. QUADRA™ combines a multi-miniaturized AFM head architecture with our proprietary Feedforward Trajectory Planner imaging technology to deliver on-device, non-destructive measurements for in-line process monitoring of amongst others very high-aspect-ratio structures, hybrid bonding and EUV resist critical dimension metrology. Deployed in major high-volume manufacturing fabs worldwide, our products empower chipmakers with the speed, precision and actionable data needed to control the most complex processes and accelerate time-to-yield.