As a long-standing equipment supplier, Vistec Electron Beam GmbH, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for industrial and advanced research applications, such as electron-beam direct write in semiconductor manufacturing, including compound semiconductor, direct write mask making as well as photonics and several new emerging markets.
Efficient data processing & extended exposure strategies open up new applications, especially in the field of AR/VR.
Vistec’s technology features automated handling, as well as high flexibility, writing accuracy and productivity and therefore is suitable for prototyping and low volume production.