Planar systems work on the same coordinate system platform with ideal compatibility in the Factory line.

MASK PATTERN GENERATORS

UV, DUV Multi-beam raster-scan technology / 16/32-beam optical architecture

AUTOMATIC MASK PATTERN INSPECTION

0.25, 0.15, 0.065µm pixel size /D2DB /High TPT /low COO

LASER MASK REPAIR

150 nm feature / Evap/Depo /Pattern copy repair /Through pellicle repair 

MASKLESS LITHOGRAPHY

1.0, 0.6, 0.35µm single-& multi-beam laser PG /Ø300mm wafer

MASK ALIGNERS

Contact/proximity printing / Double-side lithography / 0.4~0.7um resolution 

STEPPERS

Lamp/laser /0.8, 0.35 µm/ Automatic scaling /Double-side alignment /Ø200 mm wafer

AUTOMATIC WAFER DEFECT INSPECTION

Micro/macro def /Imposed def /High resolution /Low COO

WAFER INSPECTION

CD/flatness/coordinates&overlay/Visual