Planar systems work on the same coordinate system platform with ideal compatibility in the Factory line.
MASK PATTERN GENERATORS
UV, DUV Multi-beam raster-scan technology / 16/32-beam optical architecture
AUTOMATIC MASK PATTERN INSPECTION
0.25, 0.15, 0.065µm pixel size /D2DB /High TPT /low COO
LASER MASK REPAIR
150 nm feature / Evap/Depo /Pattern copy repair /Through pellicle repair
1.0, 0.6, 0.35µm single-& multi-beam laser PG /Ø300mm wafer
MASK ALIGNERS
Contact/proximity printing / Double-side lithography / 0.4~0.7um resolution
STEPPERS
Lamp/laser /0.8, 0.35 µm/ Automatic scaling /Double-side alignment /Ø200 mm wafer
AUTOMATIC WAFER DEFECT INSPECTION
Micro/macro def /Imposed def /High resolution /Low COO
WAFER INSPECTION
CD/flatness/coordinates&overlay/Visual